The Great Power Behind the Tiny Chip

When it comes to silicon carbide wafers, many people might feel unfamiliar with them. Yet in the electric vehicles and 5G communications we’re all familiar with, these wafers play an indispensable role. The reason 5G boasts such high speeds is that it has a remarkably powerful “heart”—a heart that relies on a silicon carbide wafer as thin as paper. Although it looks like just a small circular disc from the outside, as the world’s most advanced third-generation semiconductor material today, silicon carbide wafers possess numerous advantages that no other materials can match. They are the ideal substrate for manufacturing high-temperature, high-frequency, and high-power semiconductor devices. Beyond electric vehicles and 5G communications, silicon carbide wafers also hold great promise for applications in defense, aerospace, and other fields. Research and application of silicon carbide wafers are of immense strategic significance, offering irreplaceable advantages and serving as a critical support for a nation’s core competitiveness in the new generation of information technology. On May 12, General Secretary Xi Jinping visited the Innovation and Reform Exhibition Hall at the Administrative Service Center of the Shanxi Comprehensive Reform Demonstration Zone for Transformation, where he learned about the zone’s reform and innovation development progress. Located within the demonstration zone, the China Electronics Technology Corporation (Shanxi) Silicon Carbide Materials Industry Base is currently the largest silicon carbide production facility in China.

2022-02-15

How do you obtain a “perfect” silicon carbide wafer?

Currently, more than 95% of semiconductor components worldwide are based on silicon—the first-generation semiconductor material—as their fundamental functional material. However, with the rise of new applications such as electric vehicles and 5G, silicon-based semiconductors are facing inherent physical limitations of silicon itself, creating performance bottlenecks that are difficult to overcome. As a result, third-generation semiconductor materials—represented by gallium nitride (GaN) and silicon carbide (SiC)—are beginning to attract increasing attention.

2022-02-15

Independent innovation enables the localization of chip polishing materials.

Integrated circuit chips rely on a critical manufacturing process—chemical-mechanical polishing. Currently, nearly all of the key materials used for polishing in China—CMP polishing pads—are dependent on imports. Now, Hubei Dinglong Holdings Co., Ltd., headquartered in the Wuhan Economic and Technological Development Zone, has been deeply engaged in this field for nine years. Through sustained, high-level R&D investments, the company has grown into a leading player in the domestic CMP polishing pad industry and has fully integrated into the supply chains of all major wafer fabs in China.

2022-02-15

How to polish glass

1. Pour a small amount of the polishing concentrate as needed, dilute it with water at a ratio of 1:1, and never exceed a dilution ratio of 1:5. 2. At all times, ensure that there is sufficient polishing solution on the area being polished to remove scratches; under no circumstances should sandpaper be used directly to dry-grind the glass surface. 3. After replacing the polishing concentrate, use a dedicated polishing wheel to restore the glass’s clarity. Wipe the glass clean, inspect the extent of the sandpaper打磨, apply the polishing concentrate, and then polish using the dedicated polishing wheel.

2022-02-15

Can polishing cloths be washed with water?

During the polishing process, please keep the following in mind: 1. Don't apply excessive pressure to the sample; 2. When picking up the sample to inspect the polished surface, do so quickly, but when resuming grinding, make sure to proceed slowly; 3. When adding water, pour it along the radius of the polishing cloth, aiming as close to the center as possible. Avoid getting water on your hands, as this could reduce the friction between your hand and the sample, potentially causing the sample to fly off. After polishing is complete, use an alcohol-soaked cotton swab to gently wipe the ground surface in one direction—never rotate the swab or rinse the surface with water.

2022-02-15

A brief analysis of the differences in function and technology between polishing cloths and polishing leather.

Polishing leather mainly includes polyurethane polishing leather, white polishing leather, damping cloth, asphalt polishing cloth, and wool wheels. Polyurethane polishing leather is primarily used for polishing crystal glass, camera lenses, watch crystals, mobile phone screens, and other similar materials. It contains rare-earth materials such as cerium dioxide and has a hardness rating of over 90 degrees. During high-speed glass polishing, it effectively prevents issues like chipping and rounding of edges, while also being durable and highly efficient. It is currently recognized as one of the indispensable polishing materials.

2022-02-15